SPST COMMITTEE MEMBERS
*Committee members with alphabetical order. The list is being updated.
Akinori SHIBUYA 渋谷 明規 (FUJIFILM)
Atsushi SEKIGUCHI 関口 淳 (Lithotech Japan)
Atsushi Sekiguchi is Vice President of Lithotech Japan Co., Ltd. and Head of Nano Science Laboratories. After earning his Ph.D. from Tokyo Denki University, he held roles at Chemitech Japan and Sumitomo GCA, before founding Lithotech in 1993. He has led the development of resist analysis tools and lithography simulators. He has served as a visiting professor at Tokyo Denki University, Ritsumeikan University, and Osaka Public University. He has authored over 75 publications, holds 16 patents, and has delivered more than 100 lectures. He received the 2016 Japan Society of Precision Engineering Technology Award.
Ethan Choong Bong (CB) Lee (Samsung SDI)
Ethan CB Lee is Vice President and Adv. Patterning Technology Director at Samsung SDI. He has over 25 years of experiences in the semiconductor materials, especially on lithography patterning materials and process development. He made outstanding technical contributions to the industry as a global technology leader on lithographic materials area since 2002 and also a business strategy specialist representing both technology marketing and sustainability program on lithography field covering GHG and PFAS reduction, while leading collaborations with global semi industrial partners and government offices from many countries in Europe and USA beyond 2021. He worked at DuPont E.I. Semiconductor Business (2006.Nov. - 2024.May) after DuPont EM Photomask (2004-2006), DongJin Semichem (2002-2004) and Yonsei Univ. Graduate School located in Seoul, Korea.
Danilo De Simone (imec)
Danilo De Simone is scientific director at imec. He has 25 years of experience in the semiconductor R&D field and his work has produced over 150 scientific and technical papers in the field of lithographic materials and advanced patterning. Before imec, he worked for the industry for STMicroelectronics, Numonyx and Micron Technology. He is editorial board member of the Journal of Micro/Nanopatterning, Materials, and Metrology (JM3), member of SPIE committee for the Patterning Materials and Processes program and member of the International Advisory Board of the Photopolymer Science and Technology Conference (ICPST).
Haruyuki OKAMURA 岡村 晴之 (Osaka Metropolitan University)
Haruyuki Okamura received his B.S. degree in 1994, MS. degree in 1996, and Ph.D. degree in 1998 from Kyoto University for the study on synthesis and properties of fullerene-containing polymers with well-defined structures. He joined Osaka Prefecture University as a research associate in 1999. After being a visiting scientist (2009-2010) at Cornell University (USA), he was promoted to Associate Professor in 2011. He is now in Osaka Metropolitan University from 2022. His research interests include the synthesis of resist materials, photoacid generators, and reworkable resins. He is a member of the Society of Polymer Science, Japan.
Hideo HORIBE 堀邊 英夫 (Osaka Metropolitan University)
Hideo Horibe is a professor of Tohoku University and Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka Metropolitan University. He graduated from the Department of Synthetic Chemistry, Faculty of Engineering, Kyoto University and took Ph.D. in Engineering at Osaka University. His group at Osaka Metropolitan University are developing high performance of organic materials and polymer materials with new functionality that cannot be achieved by conventional method. He is serving as President of The Technical Association of Photopolymers, Japan.
Hideo OHKITA 大北 英生 (Kyoto University)
Hideo Ohkita is a Professor in the Department of Polymer Chemistry at Kyoto University. He received his PhD from Kyoto University in 1997. He became an Assistant Professor in 1997, was promoted to Associate Professor in 2006, and to Professor in 2016. He is an editorial board member of Nano Research Energy, a program committee member of the Organic, Hybrid, and Perovskite Photovoltaics program at SPIE, and a committee member of ICPST. His main research interests include studying photophysics and photochemistry in polymer systems. His current research focuses on spectroscopic and device physics approach to polymer solar cells.
Hiroto KUDO 工藤 宏人 (Kansai University)
Hiroto Kudo is the Professor of Department of Chemistry and Materials Engineering, Kansai University. He received a Doctorate in polymer chemistry from Tokyo Institute of Technology, Japan in 2000. He did postdoctoral research at the Venture Business Laboratory at Yamagata University, Japan during 2000–2001. In his career at Kanagawa University, he has progressed from Research Associate (2001) to Assistant Professor (2007), and Associate Professor (2009). In 2013, he moved to Kansai University as an Associate Professor and was promoted to Professor in 2015. His current research interests include synthesis of new functional polymers applicable to EUV resists, UV-curing materials, high and low-refractive indices materials. Since 2021, he has been a member of the ICPST director.
Hiroyuki MAYAMA 眞山 博幸 (Asahikawa Medical University)
Hitoshi ARAKI 荒木 斉 (Toray)
Hitoshi Araki received master of degree from Kyoto University and joined Toray Industries in 2005. He had developed photo-definable polysiloxane material for flat panel display until 2014. He received PhD from Kyoto Institute of Technology in 2011. He moved to University of Illinois for research of flexible electronics from 2014 to 2016 by study abroad program of Toray. Returned to Toray in 2016, and from there to the present he has been involved in research on polyimides for semiconductor packaging. He received The Chemical Society of Japan Award for Technical Development in 2018.
Itaru OSAKA 尾坂 格 (Hiroshima University)
Itaru Osaka received his doctoral degree from University of Tsukuba in 2002. After a 4-year research stint at Fujifilm, he worked as a postdoctoral researcher in Carnegie Mellon University in 2006–2009. He then started his professional carrier at Hiroshima University as an Assistant Professor in 2009, and moved to RIKEN as a Senior Research Scientist in 2013. He was appointed as a Professor at Hiroshima University in 2016. He has been awarded The Society of Polymer Science Japan Hitachi Chemical Award in 2013 and The Chemical Society of Japan Award for Creative Work for 2022. He has been an Executive Editor of Polymer Journal since 2018. His research interests include design and synthesis of π-conjugated materials, in particular, π-conjugated polymers for organic electronics such as field-effect transistors and solar cells. He has been the ICPST director of awards since 2022.
Jun TANIGUCHI 谷口 淳 (Tokyo University of Science)
Kazuma KURIHARA 栗原 一真 (AIST)
Kenji YOSHIMOTO 吉元 健治 (Kanazawa University)
Kenji MIYAO 宮尾 憲治 (Sumitomo Bakelite)
Kensuke OSADA 長田 健介 (National Institutes for Quantum Science and Technology)
Biography: Kensuke OSADA obtained his PhD from the Department of Organic and Polymeric Materials, Tokyo Institute of Technology in 2002 while he was a JSPS DC1. Dr. Osada moved to the Prof. Kazunori Kataoka' group in The University of Tokyo as a JSPS postdoctoral fellow and promoted to a Project Assistant Professor in 2004 and Project Associate Professor in 2006. During 2012-2016, he was a JST-PRESTO researcher. He moved to the Institute for Quantum Medical Science, National Institutes for Quantum Science and Technology in 2018 as a chief scientist and promoted to a Group Leader and Senior Principal Investigator in 2023.
Kuniharu TAKEI 竹井 邦晴 (Hokkaido University)
Professor Kuniharu Takei is a professor at Hokkaido University in Japan since 2023. Before joining Hokkaido University, he was a postdoctoral fellow at University of California, Berkeley, an assistant/associate/full professor at Osaka Prefecture University, and a full professor at Osaka Metropolitan University. His current research interests are to build the platforms for multimodal, high-performance flexible electronics using both inorganic and organic materials. Furthermore, for automatic and real-time data analyses, machine learning is also developed to incorporate with the multimodal flexible sensor system.
Masashi YAMAMOTO 山本 雅史 (National Institute of Technology, Kagawa College, NIT)
Masayuki ENDO 遠藤 政孝 (E Litho Research)
Dr. Masayuki Endo is currently working at E Litho Research, where he is conducting consulting on resists and lithography, technical research, and lectures. Before current position, he worked at Matsushita Electric Industrial, Panasonic, and Osaka University, where he was involved in the development of semiconductor lithography, resists, and resist processes.
Minoru TSUDA 津田 穰 (Chiba University)
SPST Ex-president
Patrick Naulleau (EUV Tech)
Sanjay Malik (SCREEN Semiconductor Solutions)
Sanjay Malik is a seasoned technology leader with extensive experience in developing and commercializing innovative materials in the diverse areas of semiconductors, pharmaceuticals, and petrochemicals. Currently working at SCREEN Semiconductor Processing Equipment. As Director of Advanced R&D, he has assumed the responsibility of leading a global team of scientists and engineers to develop novel semiconductor processes based on the principles of enhanced efficiency and sustainability. He holds over 120 patents and is known for building diverse, high-performing teams and fostering strategic collaborations.
Satoshi TAKEI 竹井 敏 (Toyama Prefectural University)
Satoshi Takei is a professor at Life Science Material Laboratory in Toyama Prefectural University, and a visiting academic staff in Osaka University. His current interests are functional patterning materials and eco-friendly engineering processes using nanoimprint and advanced lithography for life science and healthcare application. He was a member in Nissan Chemical from 1998 to 2010. In 2001, he was a visiting assignee in IMEC. In 2009, he was a visiting scientist in University of Texas at Austin and NNIN. In 2024, he was a visiting professor in University of Technology Malaysia.
Seiji NAGAHARA 永原 誠司 (ASML Japan)
Seiji Nagahara is Head of Technical Marketing at ASML Japan. Previously, he held key roles at Tokyo Electron Ltd. (TEL), Renesas Electronics and NEC, focusing on next-generation lithography and tool/process development. His career includes collaborative research with institutions like Toshiba, IMEC in Belgium, UC Berkeley, Argonne National Laboratory, and EIDEC. He holds a Bachelor's, Master's, and Ph.D. degrees in Engineering from Osaka University, Japan. He is SPIE Fellow and also holds positions in several academic and technical societies. He is serving as Vice President and Board Member of the Society of Photopolymer Science and Technology (SPST).
Shin-ichi KONDO 近藤 伸一 (Gifu Pharmaceutical University)
Shin-ichi Kondo is a professor of Gif Pharmaceutical University. He received his Ph.D. from Gifu Pharmaceutical University in 1991. He became an Assistant Professor in 1991, was promoted to Associate Professor in 2001, and to Professor in 2007. His research interests are the fabrication of self-assembled phospholipid layer onto the polymer surface by plasma-assisted method and its bio-application, and the development of highly functionalized polymer for drug delivery system.
Shinji YAMAKAWA 山川 進二 (University of Hyogo)
Shinji Yamakawa received his Bachelor's and Master's degrees in chemistry from Kansai University, Japan, in 2014 and 2016, and his Ph.D. (Eng.) degree from Tokyo Institute of Technology, Japan, in 2019. He was a specially appointed assistant professor at Tokyo Institute of Technology from 2019 to 2020. In 2020, He joined the Laboratory of Advanced Science and Technology for Industry (LASTI) of University of Hyogo as an assistant professor. Since Oct. 2024, he has been an associate professor. He has been awarded The Photopolymer Science and Technology Award: Best Paper Award in 2023. His current research interests are the synthesis of photoresists for next-generation lithography and the reaction mechanism analysis of EUV resist under EUV irradiation. He has been the SPST director of publication since Jan. 2025.
Sosuke OSAWA 大澤 壮祐 (JSR)
Takanori ICHIKI 一木 隆範 (The University of Tokyo)
Dr. Takanori Ichiki has been a Professor at the Department of Materials Engineering and the Department of Bioengineering, School of Engineering, The University of Tokyo since 2016. He also serves as Research Director of the Innovation Center of NanoMedicine (iCONM) of the Kawasaki Institute of Industrial Promotion. After completing his PhD in Metallurgical Engineering at the University of Tokyo in 1995, he has been engaged in nanobiotechnology research integrating semiconductor technology and biology in academia. He specializes in nanobiotechnology, surface and interface engineering, and nano- and microfabrication.
Takashi KARATSU 唐津 孝 (Chiba University)
Takayuki MUROSAKI 室崎 喬之 (Asahikawa Medical University)
Takehiro SESHIMO 瀬下 武広 (Tokyo Ohka Kogyo)
Takehiro Seshimo received his B.S. degree in 2003, MS. degree in 2005, and Ph.D. degree in 2016 from Tokyo Institute of Technology. He joined TOKYO OHKA KOGYO CO., LTD. in 2005, and he worked as a visiting scientist at the University of Texas at Austin from 2011 to 2013. His research focuses on block copolymer materials for directed self-assembly.
Takeo WATANABE 渡邊 健夫 (University of Hyogo)
Takeo Watanabe received his Ph.D. from Osaka City University in 1990. He is now the Principal Investigator of Next Generation EUVL Research Endowed Chair, the Project Professor of Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo. Previously, he was assigned as a special advisor to the president, director of the Center for EUVL, and Dean of LASTI, at the University of Hyogo. He is an expert of the EUV lithographic technology, including optics, exposure tool, mask, resist, and pellicle etc., and contributes with EUVL and next generation EUVL fundamental researches. He has authored over 270 technical papers, and he is the president of the International Conference of Photopolymer Science and Technology (ICPST). He is also Conference Chair of the International Conference of Photomask Japan (PMJ). He is a program committee member of the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN). Furthermore, he is a committee member of lithography of IRDS.
Taku HIRAYAMA 平山 拓 (HOYA)
Taku HIRAYAMA is a Director in Development-II of Blanks SBU in HOYA LSI Division. He received his B.S. (1993), M.S. (1995) from Tokyo University of Science and Ph.D. (2005) from the Institute of Science Tokyo. From 1995 to 2006, he worked for TOK as an engineer in photoresist R&D for 365nm, 248nm, 193nm immersion, and EB lithography. From 2006 to 2008, he was assigned from TOK and worked as a visiting scientist at IMEC to study 193nm immersion resist technology. From 2009 to 2015, he led EUV resist, EB resist and DSA material deveopment as a manager in TOK. In 2015, he joined Merck Performance Materials as a Director of litho-related material R&D. In 2019, he moved to HOYA LSI Division in R&D to lead EB resist technology and process development.
Takumi UENO 上野 巧 (Shinshu University)
Takumi Ueno is Research Professor of Shinshu University, where he is teaching and consulting on resists, polyimides and photosensitive materials for LSI packaging, Before current position, he worked at Hitachi Ltd., Hitachi Chemical Co., and HD MicroSystems, where he was involved in the development of resists, photosensitive polyimides, and photosensitive materials for LSI packaging.
Teruaki HAYAKAWA 早川 晃鏡 (Institute of Science Tokyo)
Teruaki Hayakawa is a Professor in the Department of Materials Science and Engineering at the Institute of Science Tokyo. He received his B.Sc. (1995), M.S. (1997), and Ph.D. (2000) degrees from Yamagata University, specializing in polymer materials science and engineering. From 1997 to 1998, he was a visiting student at Cornell University. In 2000, he joined the National Institute of Advanced Industrial Science and Technology (AIST) as a researcher. He moved to Tokyo Institute of Technology as an Assistant Professor in 2003, was promoted to Associate Professor in 2009, and became a Full Professor in 2017. His research focuses on directed self-assembly block copolymer materials, low dielectric loss polymers, high thermal conductivity epoxy materials, and wholly aromatic condensation polymers. He also serves as an Associate Editor for Materials Today Chemistry.
Yoshihiko HIRAI 平井 義彦 (Osaka Metropolitan University)
Yoshio KAWAI 河合 義夫 (Shin-Etsu Chemical)