Journal of Photopolymer Science and Technology Site
Journal of Photopolymer Science and Technology (JPST): Advancing Photopolymer Science and Applications
The Journal of Photopolymer Science and Technology (JPST) is a peer-reviewed, open-access journal that publishes high-quality articles across all aspects of photopolymer science and
technology. Established in 1988 and supported by the Society of Photopolymer Science and Technology (SPST), JPST serves as a trusted platform for sharing innovative research, fostering
collaboration, and driving advancements in the field.
About the Journal
JPST publishes a diverse range of content, including General Papers, Communications, Technical Papers, and Reviews, ensuring comprehensive coverage of both foundational research and practical
applications. The journal is available online and in print, with issues released biannually in June and December. Its mission is to provide the global photopolymer community with a forum for the
exchange of ideas, knowledge, and progress.
Research Areas Covered by JPST
JPST covers a broad spectrum of topics reflecting the interdisciplinary nature of photopolymer science, including:
- Advanced Lithography and Nanotechnology: Next-generation lithography (EUV, EB lithography, nanoimprint, DSA), computational approaches, and 193 nm lithography extensions.
- Photopolymers in Manufacturing: Innovations in 3D printing, additive manufacturing, and strategies for advanced packaging, MEMS, and flexible devices.
- Materials for Emerging Technologies: Organic and hybrid materials for photovoltaic and optoelectronic devices, and high-performance polymers such as polyimides and thermally stable resins.
- Biotechnology and Biomimetics: Research in nanobiotechnology and biomimetic materials and processes.
- Fundamental Chemistry and Functionalization: Advanced photopolymer chemistry, plasma photochemistry, and polymer surface functionalization.
- General Photopolymer Science and Technology: Interdisciplinary and foundational studies driving innovation across fields.
Why Publish in JPST?
JPST is dedicated to fostering the global photopolymer community by offering:
- Rigorous peer review by leading experts in the field.
- Open access to ensure maximum visibility and impact of your research.
- A global audience spanning academia, industry, and government sectors.
- Opportunities to contribute to a journal with a long-standing reputation for excellence.
Submit Your Work
JPST invites researchers and professionals worldwide to share their discoveries and insights. Whether your work is focused on pioneering new materials, developing innovative processes, or
exploring novel applications, JPST provides the ideal platform to showcase your contributions.
For submission guidelines and additional details, please visit the guidelines in this JPST website. Join us in advancing the frontiers of photopolymer science and technology!
https://www.jstage.jst.go.jp/browse/photopolymer
Editorial Board
Editor-in-Chief: Shinji YAMAKAWA, University of Hyogo
Co-Editor-in-Chief: Haruyuki OKAMURA, Osaka Metropolitan University
Editors: Masayuki ENDO, Osaka University
Teruaki HAYAKAWA, Institute of Science Tokyo
Yoshihiko HIRAI, Osaka Metropolitan University
Taku HIRAYAMA, HOYA Corporation
Hideo HORIBE, Osaka Metropolitan University
Takanori ICHIKI, The University of Tokyo
Takashi KARATSU, Chiba University
Yoshio KAWAI, Shin-Etsu Chemical Co., Ltd.
Shin-ichi KONDO, Gifu Pharmaceutical University
Hiroto KUDO, Kansai University
Kazuma KURIHARA, AIST
Takayuki MUROSAKI, Asahikawa Medical University
Seiji NAGAHARA, ASML Japan
Hideo OHKITA, Kyoto University
Itaru OSAKA, Kyoto University
Atsushi SEKIGUCHI, Litho Tech Japan Corporation
Takehiro SESHIMO, Tokyo Ohka Kogyo Co., Ltd.
Noriaki SHIBUYA, FUJIFILM Corporation
Kuniharu TAKEI, Hokkaido University
Jun TANIGUCHI, Tokyo University of Science
Takumi UENO, Shinshu University
Takeo WATANABE, University of Hyogo
Masashi YAMAMOTO, Nat. Inst. Tech. Kagawa College
Kenji YOSHIMOTO, Kanagawa University
International Advisory Board
Ralph R. DAMMEL, AZ Electronics Materials
Paul F. NEALEY, University of Chicago
Christopher K. OBER, Cornell University
The Editorial Office
The Editorial Office
Shinji Yamakawa
Journal of Photopolymer Science and Technology
Laboratory of Advanced Science and Technology for Industry,
University of Hyogo,
3-1-2 Koto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
E-mail: s.ymkw(at)lasti.u-hyogo.ac.jp
Important information:
Application and abstract deadline for ICPST: February 14, 2025
JPST Paper deadline: April 1, 2025