ICPST-42 (2025) ABSTRACTS
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A1. Next Generation Lithography, EB Lithography and Nanotechnology
Symposium Chair: Masayuki ENDO (Osaka University)
A2. Nanobiotechnology
Symposium Chair: Takanori ICHIKI (The University of Tokyo), Kensuke OSADA (National Institutes for Quantum Science and Technology)
Presentation title: Lipid Nanodiscs Formed by Lipoprotein-Mimetic Polymers and Their Applications in Drug Delivery (Invited)
Author(s): Kazuma Yasuhara, Nara Institute of Science and Technology
Abstract: Lipid nanodiscs are the smallest lipid bilayer assemblies formed in aqueous solution. In this study, we designed amphiphilic polymethacrylate derivatives for lipid nanodisc formation. The optimal polymer, selected through library screening, formed discoidal lipid membranes with diameters of several tens of nanometers. We demonstrated that the polymer-based nanodiscs can be used for analyzing membrane-binding amyloidogenic peptides and as nanocarriers for molecular delivery into intact cells.
Presentation title: Nano-Sized Contrast Agent Based on a Novel Self-Folding Macromolecular Architecture for MRI-Based Cancer Diagnosis (Invited)
Author(s) and affiliation(s): Shan Gao 1, Yutaka Miura 2, Akira Sumiyoshi 1, Nobuhiro Nishiyama 2, Ichio Aoki 1 and Kensuke Osada 1, 1 National Institutes for Quantum Science and Technology and 2 Institute of Science Tokyo
Abstract: In this study, a nano-sized contrast agent was developed based on a novel self-folding macromolecular drug carrier (SMDC) architecture with a size of 5–10 nm for MRI-based cancer diagnosis. The SMDC forms via the intramolecular self-folding of a designed random copolymer in water. Gadolinium chelates were incorporated into the SMDC to serve as a contrast agent, and its improved relaxivity and enhanced tumor accumulation were elucidated. The feasibility of this nano-sized contrast agent was demonstrated by the contrast enhancement effect in MRI for cancer.
Presentation title: Optimal radiation dose to induce the abscopal effect through the combination of carbon-ion radiotherapy and immune checkpoint therapy (Invited)
Author(s) and affiliation(s): Liqiu Ma 1,2, Lin Xie 1, Kensuke Osada 1, Yukari Yoshida 2, Akihisa Takahashi 2 and Takashi Shimokawa 1, 1 Institute for Quantum Medical Science, National Institutes for Quantum Science and Technology (QST), 2 Gunma University Heavy Ion Medical Center
Abstract: Although carbon-ion radiotherapy (CIRT) has shown good outcomes, metastasis control remains a crucial issue. This study evaluated the abscopal effect of combining CIRT with immune checkpoint therapy (ICT) at different radiation doses. Tumor-bearing mice were treated with 3 Gy or 10 Gy of CIRT, followed by ICT. High-dose CIRT combined with anti-CTLA4 antibody showed excellent local control but no abscopal effect. In contrast, 3 Gy CIRT with anti-CTLA4 antibody reduced the volume of distant tumors by 40%, suggesting an optimal dose for inducing the abscopal effect.
Presentation title: Photo-responsive cell anchoring surface for single-cell phenotype analysis (Invited)
Author(s) and affiliation(s): Satoshi Yamaguchi, Osaka University
Abstract: Advances in genetic analysis technologies have led to increasing attention on the heterogeneity of individual cells within cell populations in recent years. As a result, techniques for analyzing the phenotype of cells at the single-cell level are becoming increasingly important. We have previously developed light-responsive cell anchoring surfaces. In this presentation, I will introduce our research on constructing a single-cell array using light-activatable cell ancho surfaces, and acquiring time-series image data at the single-cell level to study the phenotypes of cells.
A3. Directed Self Assembly (DSA)
- Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials, Advanced Devices using Self Assembly, etc.) -
Symposium Chairs: Seiji NAGAHARA (ASML Japan) , Teruaki HAYAKAWA (Institute of Science Tokyo), and Takehiro SESHIMO (Tokyo Ohka Kogyo)
Presentation title: IR-AFM metrology on latent images in DSA and EUVL photoresist (Keynote)
Author(s) and affiliation(s): Diederik Maas1, Maarten van Es1, Komal Pandey1, Adam (Chung Bin) Chuang1, Takehiro Seshimo2, and Teruaki Hayakawa3,1Netherlands Organisation for Applied Scientific Research – TNO, 2Tokyo Ohka Kogyo, 3Institute of Science Tokyo
Abstract: Resist stochastics ultimately limit patterning, a result of interplay of resist composition, exposure, bake and development. Metrologies like OCD and CD-SEM only measure uniformity after development, offering limited process control. But each step modifies molecular bonds, leaving IR (5-20 µm) fingerprints in activated chemical structures. When combining IR & AFM, nearfield effects resolve alterations at the nm scale. We show how IR-AFM offers chemical selectivity and lateral resolution to resolve modifications in latent DSA and EUVL images, even before PEB and development.
Presentation title: Self-assembly of Carbohydrate Block Copolymers: From Glyconanoparticles to thin films to photonic crystals (Invited)
Author(s) and affiliation(s): Redouane Borsali, POLYNAT CARNOT INSTITUTE, GRENOBLE, FRANCE
Abstract: The self-assembly of carbohydrate block copolymer systems at the nanoscale level via the bottom-up approach, has allowed the conception of novel nanostructured biomaterials. We will present recent results on the self-assemblies of carbohydrate-based block copolymer leading to nanoparticles presenting different shapes (spherical, cubic, …), highly nanostructured thin films for nanobioelectronic applications and more recently brush-like glycopolymers exhibiting photonic crystals behavior leading to colored materials.
A4. Computational / Analytical Approach for Lithography Processes
Symposium Chairs: Kenji YOSHIMOTO (Kanazawa University), and Sosuke OSAWA (JSR)
Presentation title: Neural Network Molecular Dynamics Simulations on Synthesis Process of MoS2 Thin Films from Molybdenum Ditiocarbamate Molecules (Invited)
Author(s) and affiliation(s): Momoji Kubo, Tohoku University
Abstract: Two-dimensional MoS2 thin film has gained much attention as not only semiconductor materials but also super-low friction materials. However, its ability is significantly influenced by the quality of the MoS2 thin film. Therefore, the synthesis process of the MoS2 thin film should be clarified and optimized on atomic scale. In the present study, we applied our in-house neural network molecular dynamics simulation code “Laich+” to investigating the synthesis process of two-dimensional MoS2 thin films from molybdenum ditiocarbamate molecules.
Presentation title: Incorporating advanced scanner models in semiconductor manufacturing (Invited)
Author(s) and affiliation(s): Wim Tel, Rob Faessen, Philipp Strack, Pieter Smorenberg, Jaap Karssenberg, Hakki Ergun Cekli, Seiji Nagahara, ASML holding Netherlands
Abstract: Semiconductor device manufacturing seems to be on a collision course between ever more aggressive processing and tightening of specifications. This puts ultimate pressure on correctability. In order to maximally exploit the correction capability of the lithography tool a new scanner control paradigm is proposed. This includes a more holistic view on lithography which maximizes the correctability and co-optimize key performance parameters as well as the use of highly accurate scanner simulation models
Presentation title: Formulation of Developer Solutions Using Integrated Computational Approaches (Invited)
Author(s) and affiliation(s): Yuqing Jin1, Takehiro Masuda1, Yuko Tsutsui Ito1, Takahiro Kozawa1, Takashi Hasebe2, Kazuo Sakamoto2, Makoto Muramatsu2, 1 SANKEN, Osaka University, 2 Tokyo Electron Kyusyu Limited
Abstract: Novel photoresist and developers are being developed to further shrink the feature size. This study evaluated various developers to improve pattern quality, examining the resulting line-and-space patterns via the Hough transform and evaluating SEM images. Quartz crystal microbalance simulations, including frequency and impedance changes, further illuminated how developer chemistry influences lithographic performance. This work established a method to investigate key insights into how developer chemistry influences lithography performance.
Presentation title: Molecular dynamics study of early stages of development process (Invited)
Author(s) and affiliation(s): Masaaki Yasuda, Ryuki Tanaka, Kousei Tada, and Hiroto Wakamatsu, Osaka Metropolitan University, Japan
Abstract: The early stage of the development process in lithography was analyzed by molecular dynamics simulation. The penetration of developer molecules into the resist, the swelling of the resist, and the removal of the resist molecules were analyzed. We also investigated the differences in molecular behavior depending on the type of resist and developer.
A5. EUV Lithography
Symposium Chairs: Takeo WATANABE (University of Hyogo), Hiroto KUDO (Kansai University), Yoshio KAWAI (Shin-Etsu Chemical), Taku HIRAYAMA (HOYA), Shinji YAMAKAWA (University of Hyogo), Sosuke OSAWA (JSR), and Ethan Choong Bong (CB) Lee (Samsung SDI)
Presentation title: Patterning materials in the era of high NA EUV Lithography (Invited)
Author(s) and affiliation(s): Danilo De Simone, IMEC, Belgium
Abstract: In the last years, a patterning roadmap and a large ecosystem was established at imec to enable the device dimensional scaling by using the high NA EUVL technology and tackle its challenges. The high NA EUVL Lab was open in June 2024, and it started delivering to imec its first wafers, showing its potential by printing sub-12nm features. In this work the progress on the patterning activities is illustrated with focus on the lithographic processes and materials in the era of high NA EUV lithography.
Presentation title: EUV-FEL as a future light source for advanced lithography (Invited)
Author(s) and affiliation(s): Hiroshi Kawata, Yosuke Honda, Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto, Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono, High Energy Accelerator Research Organization (KEK)
Abstract: The future light source for advanced lithography should have the following performances: high power more than 1kW to reduce stochastic variation, polarization control, wavelength tunability and cost reduction of the running cost per scanner. To conclude, EUV-FEL is a most promising candidate, so our group has done design work and R&Ds to realize the EUV-FEL. At the conference, we will present our latest development status.
Presentation title: Resist imaging by laser-based photoemission electron microscopy (Invited)
Author(s) and affiliation(s): Toshiyuki Taniuchi, The University of Tokyo
Abstract: The research presents a new high-throughput imaging method for resist using Photoemission electron microscopy (PEEM). By combining a continuous wave laser with an aberration corrector, this laser-PEEM system achieves spatial resolution below 3 nm. Due to PEEM's high sensitivity to chemical states, it enables the observation of not only developed patterns but also latent images before development, demonstrating its versatility as a projection-type microscopy tool for lithography.
Presentation title: Double Amplification Resists from Acid-Catalyzed Chain-Unzipping of Polyphthalaldehyde-Based Polymers (Invited)
Author(s) and affiliation(s): Rachel Snyder 1, Shintaro Yamada 1, MingQi Li 1, Kyung Hee Oh 2, Jae Hyun Kim 2, Madan Biradar 3, Gokhan Sagdic 3, Christopher K. Ober 3, 1 DuPont Electronics & Industrial, 2 SK hynix Inc., 3 Cornell University
Abstract: Next-generation “double amplification resists” (DARs) use acid catalysis to initiate spontaneous depolymerization and offer a promising strategy for high resolution patterning and fast throughput in EUV lithography. We developed a series of DARs using polyphthalaldehyde derivatives and compared their performance to chemically amplified resists (CARs). In this paper, we will discuss the advantages of DARs, focusing on the resist mechanism and insights from KrF studies. We also describe how polymer design impacts resist performance in EUV lithography.
Presentation title: Inspection of next generation hybrid EUV resists with NP-SIMS (Invited)
Author(s) and affiliation(s): Gregrey Swieca 1, Won-Il Lee 2, Shixian Ha 2, Nikhil Tiwale 3, Chang-Yong Nam 2,3, and Michael J. Eller, 1. California State University, Northridge, 2. Stony Brook University 3. Brookhaven National Laboratory
Abstract: Novel organic-inorganic hybrid resists are receiving much attention as they exhibit high EUV sensitivity and improved etch resistance. Nano-projectile secondary ion mass spectrometry (NPSIMS) is a variant of traditional SIMS for nanoscale inspection of next-generation hybrid resists with lateral resolution to meet the needs of state of the art for EUV patterning. We applied NP-SIMS to study samples of PMMA infiltrated with varying amounts of InOx via vapor-phase infiltration (VPI) and examined the uniformity of In infiltration and the formation of In clusters in PMMA.
Presentation title: Double-Deprotected Acids: Polymeric Esters and Acid Amplifiers (Invited)
Author(s) and affiliation(s): Seth Kruger1, Brian Cardineau2, William Earley, Kenji Hosoi3, Koichi Miyauchi3, Robert L. Brainard4, 1NYCREATES, 2Inpria, 3Central Glass, 4University at Albany
Abstract: We describe two strategies for improving the capabilities of chemically amplified resists based on the use of double-deprotected blocking groups on sulfonic acids and carboxylic acids. Although these molecules share a similar blocking-group, we customize these compounds to take advantage of two different decomposition mechanisms, autocatalysis and higher order reactions. Both mechanisms have the potential to produce patterns with improved resolution and LER. Autocatalysis is achieved by incorporation of acid amplifiers (AAs) into the photoresist formulation and has been shown previously to improve the lithographic performance of photoresists. Here, we present new acid amplifiers that produce highly-fluorinated, strong sulfonic acids that are 100,000x more stable than previously reported compounds. Higher order reactions are achieved by utilizing novel blocking groups that require two acid-catalyzed steps to be removed. When both steps occur with comparable reaction rates, the overall reaction should be “higher order” (£ 1.85). We call these resist systems Double-Deprotected Chemically AMplified Photoresists (DD-CAMP). We present the synthesis and lithographic evaluation of multiple DD-CAMP photoresists.
Presentation title: Current Challenges in Photoresist (Invited)
Author(s) and affiliation(s): Mark Neisser1,2 , 1Tsinghua University, 2International Institute of Tsinghua University, Shanghai
Abstract: The current challenges of photoresist relate to stochastics, imaging dose, process windows, and achieving adequate etch resistance. Stochastics not only forces higher dose to print as feature sizes shrink but produces defects that are hard to measure and find. Defects can be such that they are only seen after etch. Metal based positive tone resist is desirable, but not easily accomplished. The sources of these issues and some approaches to possible solutions are discussed along with some relevant simulation and experimental work.
Presentation title: Characterization of latent image of photoresist via critical-dimension resonant soft X-ray scattering (Invited)
Author(s) and affiliation(s): Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, Cheng Wang, Lawrence Berkeley National Lab, 1 Cyclotron Rd, Berkeley, CA, 94720, USA
Abstract: Metrology is essential for accurate characterization and optimization of EUV lithography as critical dimensions shrink below 10 nm. We introduce CD-RSoXS, combining near-edge X-ray absorption fine structure spectroscopy, scatterometry, and multiphysics modeling, to non-destructively probe the 3D structure and chemistry of nanostructures across EUV lithography stages—latent imaging, post-exposure bake, and development—providing crucial insights into stochastic variations driven by material property, processing, chemistry, and photon/electron-induced effects.
Presentation title: New Activity of EUV Light Source for Semiconductor Manufacturing in Kyushu-University (Invited)
Author(s) and affiliation(s): Yukihiko Yamagata 1, Hakaru Mizoguchi 1,2, Kentaro Tomita 3, Daisuke Nakamura 1, Takeshi Higashiguchi 4, Atsushi Sunahara 5, Katsunobu Nishihara 6, Takashi Toshima 2, Hiroki Kondo 1, Takuji Sakamoto 2, Tanemasa Asano 2 and Masaharu Shiratani 1,2, 1 Kyushu University, 2 EUV Photon Co. Ltd., 3 Hokkaido University, 4 Utsunomiya University, 5 Purdue University, USA, 6 Osaka University
Abstract: A new EUV exposure research center "EUV Photon Co." has been established to support material development for EUV lithography. An EUV exposure system is being prepared for this purpose. The second topic focuses on Sn plasma dynamics studied using Thomson scattering measurements. Our group demonstrated the possibility of achieving CE 10 % through both simulation and experiment last year. These results suggest further potential for improving EUV output and CE. Finally, a high power EUV source research program in collaboration with Riken and other universities will be described.
A6. Nanoimprint
Symposium Chairs: Yoshihiko HIRAI (Osaka Metropolitan University), Jun TANIGUCHI (Tokyo University of Science), Satoshi TAKEI (Toyama Prefectural University), and Sosuke OSAWA (JSR) , and Kazuma Kurihara (AIST)
Presentation title: Optical polymer wafers for waveguide of AR Glasses (Invited)
Author(s) and affiliation(s): Akifumi Aono, Eiichiro Hikosaka, Takeshi Shinkai, Takashi Kasai, Akihiro Muramatsu, Mitsui Chemicals, Inc.
Abstract: We have developed new optical grade polymer wafer, a lightweight, durable, and scalable alternative to traditional glass wafers for waveguides of AR glasses. In this report, we will discuss how polymer wafer works seamlessly in the nanoimprint lithography process and functions effectively as a waveguide.
A7. 193 nm Lithography Extension
Symposium Chair: Yoshio KAWAI (Shin-Etsu Chemical)
A8. Photopolymers in 3-D Printing/ Additive Manufacturing
Symposium Chair: Takumi UENO (Shinshu University)
Presentation title: Initiator-free recyclable resin available for two-photon lithography (Invited)
Author(s) and affiliation(s): Masaru Mukai 1, Wakana Miyadai 2, Shoji Maruo 1, 1 Faculty of Engineering, Yokohama National University 2 Graduate School of Engineering Science, Yokohama National University
Abstract: Rapid manufacturing with stereolithography is gaining attention, increasing demand for high-precision large-scalemodeling. However, cured resins are difficult to reuse. While reusable resins are being developed, they require radical polymerization initiators, causing material changes. This study presents a photocurable resin that can be recycled without an initiator, offering a sustainable solution for high-precision two-photon lithography.
A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
Symposium Chairs: Takumi UENO (Shinshu University), Sanjay Malik (SCREEN SPE USA), and Kuniharu TAKEI (Hokkaido University),
Presentation title: Creating Innovation for Sustainable World in Partnership with Semiconductor Eco System (Keynote)
Author(s) and affiliation(s): Takumi Mikawa, SCREEN Semiconductor Solutions, Japan
Abstract: Recent advances in generative AI are driving device scaling, 3D stacking and system integration. Those have a wide impact on the development of technology from material suppliers to system vendors. More complex device structures and new materials are explored for next generation. In order to meet high customer requirements, we need to develop the innovative wet cleaning solutions such as removal of smaller particle and extremely high etching selectivity/uniformity. Also, working on environmental issues has been increasingly important. Our Semiconductor Eco System. by collaborating with institutes, suppliers, and academia, we can create innovation for sustainable world in partnership to provide customer value. In the case of device scaling, as Moore’s law slows down, new approaches are required to achieve higher performance and lower power consumption in semiconductor devices. Gate-all-around (GAA) FETs are replacing FinFETs as the architecture of today, and CFETs are expected to follow. A key process is to manage SiGe process with different concentrations. We are developing wet cleaning solutions for new material with imec and chemical vendors. In the case of carbon footprints, we still have a big gap under current global implemented politics to achieve net zero in 2050. Furthermore, CO2 emissions are estimated to increase with scaling device due to more process steps. Semiconductor industry needs to contribute carbon neutrality across the broad supply chain. We have developed chemical reduction by recycling cabinet and efficient circulation system to reclaim in the tool. Our CO2 emissions are mostly SCOPE3, so we need more collaborations with material suppliers and component manufacturers at upstream, and chip manufacturers at downstream in the supply chain. Wet process development in advanced ecosystems is essential to achieve high yields at leading-edge nodes, no damage to device, and a low carbon footprint during fabrication.
Presentation title: The Development of Novel Polymer Materials for Advanced MEMS Packaging (Invited)
Author(s) and affiliation(s): Takenori Fujiwara, Toray Industries, Inc.
Abstract: This talk covers the trends and challenges specific to advanced packaging polymer materials technology, including cavity formation and multi-stacked dielectric layers for MEMS devices. We will introduce polymer material property and processing technology how to make the organic cavity structure by using permanent dry film resist with tenting lamination and photolithography process or polymer sealing technology and so on. We will also report that feature of MEMS packaging properties.
Presentation title: Development of a Novel Negative-Tone Dry Film Resist with PVA Layer for Wiring with 1.5/1.5 µm Line/Space (Invited)
Author(s) and affiliation(s): Natsuki Toda, Kei Togasaki, Kensuke Yoshihara, Yosuke Kaguchi, Ayane Mochizuki, Kanako Funai, Hitoshi Onozeki, Kenichi Iwashita1, 1Resonac Corporation
Abstract: The semiconductor package substrate requires high-density connections to enhance signal transmission speed, and 2.xD packages with fine redistribution layers (Line/Space = 2/2μm or less) are attracting attention from the market. In order to form fine wiring with high precisions, our company has developed a negative-tone dry film with a protective layer consisting mainly of polyvinyl alcohol (PVA) as a new technology. In this presentation, we will discuss the functions of PVA and the wiring formation characteristics of this dry film.
Presentation title: Carrier warpage improvement using non-photosensitive dielectric material for high I/O density organic RDL (Invited)
Author(s) and affiliation(s): Guillermo Fernández 1, 1 TSMC Japan 3DIC
Abstract: In this study, we demonstrated that non-photosensitive polyimide material can effectively reduce the warpage in the RDL fabrication process. It was also demonstrated that crack initiation risk on stack via can be reduced. Last, via opening ability was experimentally tested by excimer laser and plasma dry etching techniques, both methods allowed via size equivalent to conventional photosensitive dielectrics.
Presentation title: Hybrid Integration for Advanced Electronic-Photonic Packaging (Invited)
Author(s) and affiliation(s): Yuma Yoshida , Taiga Sakamoto, Masahiro Matsunaga, Takashi Kawamori, Masayoshi Nishimoto, Resonac Corporation
Abstract: This presentation focuses on the challenges in hybrid integration for electronic-photonic packaging, particularly integrating optical and electronic components into a single package. As demand grows for higher bandwidth, lower latency, and reduced power consumption, photonic-electronic integration advances. However, challenges like thermal management, signal integrity, and scalability remain. The presentation explores solutions, emphasizing advanced packaging techniques, material innovations, and design considerations.
Presentation title: Atomic-level analysis of Cu/polyimide interface under high temperature storage and the investigation of adhesion degradation mechanism. (Invited)
Author(s) and affiliation(s): Yugo Kubo, Sumitomo Electric Industries, Ltd.
Abstract: Understanding the interfacial state of Cu/polyimide is crucial in the development of semiconductor packaging. We formed a Cu thin film on a polyimide substrate using a vacuum evaporation method and thoroughly investigated the microscopic changes over time of the "oxidation diffusion layer" generated by heating it at 150°C in the atmosphere, utilizing cutting-edge analytical techniques. In this presentation, I will discuss the mechanisms behind the decrease in interfacial adhesion that occurs with the growth of the "oxidation diffusion layer".
Presentation title: Development of Negative-tone Photosensitive Dielectric Materials for Fine Pitch RDL in Chiplet Integration (Invited)
Author(s) and affiliation(s): Toshiyuki Ogata, 3D Packaging Materials Project, Research Division, TAIYO HOLDINGS CO., LTD.
Abstract: In this work, we developed negative-tone photosensitive dielectric material with fine resolution and high insulation reliability for Fine Pitch Redistribution Layers (RDL) in Chiplet Integration. We achieved 0.7 micrometer L/S patterns with an aspect ratio of 3.7 using an i-line stepper. Further, we developed a test vehicle with 1 micrometer L/S patterns using the semi-additive process and evaluated the insulation reliability using a biased highly accelerated stress test (BHAST).
A10. Chemistry for Advanced Photopolymer Science
Symposium Chairs: Haruyuki OKAMURA (Osaka Metropolitan University), Takashi KARATSU (Chiba University), and Akinori SHIBUYA (FUJIFILM)
Presentation title: NIR induced anionic photopolymerization based on upconversion photochemistry (Invited)
Author(s) and affiliation(s): Quanping Xie1, Yaoxin Huang1, Pin Yang1, Zhiquan Li1, 1 Guangdong Provincial Key Laboratory of Functional Soft Condensed Matter, School of Materials and Energy, Guangdong University of Technology
Abstract: NIR light-induced polymerization offers significant advantages including deep penetration capability, minimal energy loss, and reduced biological damage compared to UV systems. This study explores an anionic photopolymerization system, integrating photobase generation with upconversion mechanisms to achieve efficient polymerization under NIR irradiation. The research demonstrates promising applications in deep-curing processes, composite material fabrication, and functional material preparation, enriching the toolbox of photopolymerization.
Presentation title: Breaking boundaries of photoinitiators: new ways to improve the reactivity of radical photopolymerization (Invited)
Author(s) and affiliation(s): Xavier Allonas, University of Haute Alsace, Mulhouse, France
Abstract: In this paper, we investigate different ways to increase the reactivity of Type I or Type II photoinitiators by introducing new latent reactive additives leading to additional initiating radicals, promoting singlet-singlet resonance energy transfer of Type I photoinitiators, overcoming diffusional limit in Type II photoinitiating system by pre-associating ion-pairs, … It is shown that high photopolymerization rates can be achieved even at very low light irradiances.
A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Symposium Chairs: Itaru OSAKA (Hiroshima University), and Hideo OHKITA (Kyoto University)
Presentation title: Chlorine-mediated organic conjugated materials and quasi-planar heterojunction devices (Invited)
Author(s) and affiliation(s): Feng He, Southern University of Science and Technology
Abstract: We have developed a series of material systems with specific transport structures by controlling the arrangement and aggregation of organic optoelectronic molecules through the Cl∙∙∙S and Cl∙∙∙π interactions. In particular, we discovered a three-dimensional (3D) network structure in the model molecules with specific chlorine-mediated intermolecular interactions. This aggregated state provides more transport junctions and channels for intermolecular electron hopping, which will increase the exciton diffusion distance and effectively improve mobility.
Presentation title: Charge Accumulation Behavior and Persistent Luminescence in Organic Materials (Invited)
Author(s) and affiliation(s): Ryota Kabe, OIST
Abstract: Photoinduced charge generation is a crucial process in solar cells, photosynthesis, and persistent luminescent materials. In organic materials, charge separation typically occurs at the electron donor/acceptor interface. While the generated charges can readily disappear via charge recombination, suppressing recombination enables the realization of a stable charge-separated state. Gradual charge recombination leads to persistent luminescence. y analyzing this luminescence behavior, we have elucidated the charge separation and recombination processes.
Presentation title: ESR analysis of charge-transporting materials in non-fullerene organic solar cells (Invited)
Author(s) and affiliation(s): Atsushi Sato 1, Kazuhiro Marumoto 1,2,3, 1 Dep. Mater. Sci., Univ. of Tsukuba, Japan, 2 OIQSST, Univ. of Tsukuba, Japan, 3 TREMS, Univ. of Tsukuba, Japan
Abstract: The power conversion efficiencies (PCEs) of non-fullerene organic solar cells have exceeded 20% and further improvement is expected. Although various insights for PCE improvements have been reported, those for stability of solar cell performance are still lacking. In the present study, for clarifying the degradation mechanism, we studied the correlation between charge states and degradation behavior in non-fullerene organic solar cells using operando electron spin resonance spectroscopy.
Presentation title: Design of low complexity active materials for photovoltaic applications (Invited)
Author(s) and affiliation(s): Division of Physical Sciences and Engineering. King Abdullah University of Science and Technology (KAUST)
Abstract: The overall efficiency of organic photovoltaic (OPV) devices has made impressive progress in recent years, but often active materials now require complex, multi-step synthesis, potentially limiting their application. We report approaches to prepare building blocks in just one or two steps, allowing the preparation of conjugated polymers of low synthetic complexity which can be readily upscaled. I will highlight how this approach can be used to readily build libraries of conjugated polymers to more rapidly identify promising materials for application in OPV.
Presentation title: Influence of Vibronic Interactions on Charge Transfer Excitons in Nonfullerene Organic Photovoltaics (Invited)
Author(s) and affiliation(s): Azusa Muraoka1
Abstract: We investigated photoinduced charge transfer (CT) states and dissociation processes at the donor/acceptor (D/A) interface of PTB7/BTAx nonfullerene organic thin-film solar cells using DFT and TD-DFT calculations. We focused on the CT distances, electron coupling in the CT state generated by photoexcitation and the Huang–Rhys (HR) factors that describe the non-adiabatic processes associated with vibronic interactions. The results reveal important insights into controlling CT exciton dynamics and optimizing charge separation for improved device performance.
Presentation title: Charge carrier dynamics at lead halide perovskite (Invited)
Author(s) and affiliation(s): Yasuhiro Tachiana1,2, 1 RMIT University, Australia, 2 Osaka University, Japan
Abstract: Lead halide perovskite has shown superior optical properties such as high extinction coefficients, slow hot carrier relaxation, long electron-hole lifetime and high charge carrier mobilities. However, mechanisms of charge carrier transport and interfacial electron-hole recombination have hardly been clarified. In this presentation, we will quantitatively demonstrate how charge carriers can be transported, and separated and recombine at the perovskite interfaces.
Presentation title: Development of Fused-Ring Acceptors for Green-Light Wavelength-Selective Organic Solar Cells (Invited)
Author(s) and affiliation(s): Seihou Jinnai, Yuto Shiono, and Yutaka Ie, Osaka Univeristy, Japan
Abstract: We are developing green-light wavelength-selective organic solar cells (OSCs) that are compatible with crop growth and electric power generation. In this study, we designed and synthesized fused-ring electron acceptors with absorption band in the green-light wavelength region (500-600 nm) and suitable electron acceptability for the combination with P3HT. OSC devices based on developed fused-ring electron acceptors and P3HT showed typical OSC characteristics.
Presentation title: Synthesis and Photovoltaic Properties of Non-Fullerene Acceptors with Quinoxaline-Based Central Unit (Invited)
Author(s) and affiliation(s): Tomokazu Umeyama 1, Kaho Yasuzato 1, Seiya Sugiura 1, Kenta Yamada 1, Jun-ichi Inamoto 1, Shunjiro Fujii 1, Wataru Suzuki 1
Abstract: We developed acceptor-donor-acceptor’-donor-acceptor (A-D-A’-D-A) type non-fullerene acceptors (NFAs) featuring a quinoxaline-based central A’ unit such as benzo[g]quinoxaline. Photovoltaic properties of such NFAs were investigated in detail.
Presentation title: Organic/Hybrid Thermoelectric Materials and Devices (Invited)
Author(s) and affiliation(s): Cheng-Liang Liu, National Taiwan University, Tiwan
Abstract: Organic thermoelectric materials can directly transform the waste heat into electrical power without causing any pollution. In my talk, we outline the design strategies which aim to develop high-performing organic semiconductors and their materials in organic thermoelectrics. A series of solution-processed organic semiconducting molecules are reported. Doping organic semiconductors, conjugated polymer composites, and gels with ionic salt or redox couples are used to achieve enhanced thermoelectric performance.
Presentation title: Enhancement of Organic Solar Cell Efficiency via Incorporation of Lead Sulfide Quantum Dots (Invited)
Author(s) and affiliation(s): Qing Shen 1, Kei Takahashi 1, Yuyao Wei 1, Taro Toyoda 1 and Shuzi Hayase 1, 1 The University of Electro-Communications, Japan
Abstract: One approach to improving the power conversion efficiency (PCE) of organic solar cells (OSCs) is the incorporation of additives that enhance light absorption and active layer morphology. In this study, we incorporated lead sulfide quantum dots (PbS QDs) into a PM6:Y6-based active layer to enhance PCE. Our results showed that adding PbS QDs improved efficiency. We further analyzed photovoltaic characteristics to elucidate the underlying mechanism, providing insights into the role of quantum dots in OSC performance.
A12. Fundamentals and Applications of Biomimetics Materials and Processes
Symposium Chairs: Hiroyuki MAYAMA (Asahikawa Medical University), Atsushi SEKIGUCHI (Lithotech Japan), and Takayuki MUROSAKI (Asahikawa Medical University)
Presentation title: Superhydrophobic PDMS using femtosecond laser-processed surface molds for anti-icing (Invited)
Author(s) and affiliation(s): Toshimitsu Sakurai 1, Toshihiro Somekawa 2, Yuji Hirai 3, Hiroki Matsushita 1, 1 Civil Engineering Research Institute for Cold Region, 2 Institute for Laser Technology / Institute of Laser Engineering, Osaka University, 3 Chitose Institute of Science and Technology
A13. Polyimides and High Thermally Stable Resins
Symposium Chair: Teruaki HAYAKAWA (Institute of Science Tokyo)
B1 (Japanese). Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications- ポリイミド及び高温耐熱樹脂ー機能化と応用ー
Symposium Chairs: Teruaki HAYAKAWA (Institute of Science Tokyo), Hitoshi ARAKI (Toray), and Kenji MIYAO (Sumitomo Bakelite)
Presentation title: Nonstoichiometric Step-Growth Polymerization Based on Intramolecular Catalyst Transfer System (Invited)
Author(s) and affiliation(s): Tomoya Higashihara, Yamagata University
Abstract: In this study, an intramolecular catalyst transfer system has been developed to achieve atypical nonstoichiometric step-growth polymerization based on the Migita-Kosugi-Stille coupling reaction using distannylated- or metal-free thiophene-based monomers and an excess of dibromo monomers, obtaining semiconducting alternating polymers with much higher molecular weights than theoretical values based on Carothers/Flory theory.
B2 (Japanese). Plasma Photochemistry and Functionalization of Polymer Surfaces
Symposium Chairs: Shin-ichi KONDO (Gifu Pharmaceutical University)
B3 (Japanese). General Scopes of Photopolymer Science and Technology一般講演
Symposium Chairs: Masashi YAMAMOTO (National Institute of Technology, Kagawa College, KIT), and Hideo HORIBE (Osaka Metropolitan University)
Invited speaker: Tatsuo Ishijima 石島達夫
Invited speaker biography: N/A
Presentation title: マイクロ波励起水蒸気プラズマアッシングプロセスにおける基板ホルダへのRFバイアス電圧印加効果 (Invited)
Author(s) and affiliation(s): 石島達夫 1, 1 金沢大学
Abstract: 水を原料とするマイクロ波励起プラズマによるアッシングプロセス法は，薬液を利用しないために環境負荷を低減し，熱によるデバイスダメージを低減できる利点を有する。近年，レジスト膜として炭素系の硬化膜の利用が検討されており，更なる除去速度の向上が求められている。本研究では基板ホルダにRFバイアス(1 MHz, 27 MHz)を印加することでレジスト除去速度を向上させるための研究開発を行った。
The other abstracts will be announced soon.